The Pieta IP engine pointed at the hardest problem in semiconductor manufacturing: the EUV lithography stack — the domain ASML dominates. Five subsystems run as independent patent campaigns — collector mirrors, reticle geometry, atomic lithography, FEL undulators, curvilinear mask inspection — then unified into a single system-level machine by the Combo tournament. This page shows the work, not the secrets: every mechanism is disclosed only under NDA.
Each part was an independent run through the full pipeline — forge generation, E1.5 trim, SYNTH hybridisation, IPS scoring with EPO prior-art collision, attorney-ready patent packaging.
| Part | Target | DB ideas | Rated | DIAMOND | GOLD | SILVER |
|---|---|---|---|---|---|---|
| Part 1asml_euv_mirror | EUV Collector Mirror | 1,701 | 31 | 0 | 15 | 13 |
| Part 2asml_smo_reticle | SMO Reticle Geometry | 926 | 42 | 1 | 17 | 22 |
| Part 3asml_atomic_litho | Atomic Lithography | 474 | 34 | 1 | 15 | 12 |
| Part 4asml_fel_defect | FEL Undulator | 1,606 | 27 | 3 | 17 | 4 |
| Part 5asml_curvilinear_defect | Curvilinear Mask Defect Detection | 868 | 30 | 2 | 12 | 15 |
| Part 6combo_ASML_Unified_System | Combo God Patent | 1 | 1 | 1 | 0 | 0 |
All seven DIAMOND-rated patents from the campaign, ranked by IPS. The 80-point ceiling-breaker came from Part 5 — curvilinear mask inspection. Titles and mechanisms are withheld; each is available for technical review under NDA.
A complete inspection topology for curvilinear masks producing a printability map at native curve resolution — the campaign's only 80-point ceiling-breaker and the portfolio's top patent. Mechanism disclosed under NDA.
Cancels chromatic error in atom-beam lithography at the source instead of compensating downstream. Mechanism disclosed under NDA.
Real-time suppression of the dominant field-error resonance in superconducting undulator arrays. Mechanism disclosed under NDA.
Drives source-mask optimisation to a statistically optimal operating point — bridging and open-circuit defects minimised simultaneously, by construction. Mechanism disclosed under NDA.
A background-nulling inspection head that isolates defect phase on curvilinear masks. Mechanism disclosed under NDA.
One-step magnetisation producing a phase-corrected field profile — no post-correction pass, no active loop. Mechanism disclosed under NDA.
Fully passive field shaping with zero control electronics and zero calibration drift. Mechanism disclosed under NDA.
The Combo tournament searched the five subsystems pairwise and unified the best-fitting idea from each into a single system-level patent — not the top-IPS idea per part, which is the point of the unification engine. One closed, self-calibrating loop across source, mask, pupil, exposure and inspection, driven to atomic-scale limits. The architecture and the master claim are disclosed only under NDA.
| # | Subsystem | Idea | IPS | Tier |
|---|---|---|---|---|
| 1 | EUV Collector Mirror | Mechanism withheldt3-15c1bcdffbc2-1 | 69 | GOLD |
| 2 | SMO Reticle | Mechanism withheldt3-03bf6fcf69d6-4 | 77 | DIAMOND |
| 3 | Atomic Lithography | Mechanism withheldp-asmlatomiclitho-anchor-a-b-c-d | 67 | GOLD |
| 4 | FEL Undulator | Mechanism withheldp-asmlfeldefect-anchor-a-d-308166 | 67 | GOLD |
| 5 | Curvilinear Defect | Mechanism withheldp-asmlcurvilineardefec-anchor-a-b-c-d-2798a5 | 67 | GOLD |
The unified master claim — a single independent claim spanning all five subsystems and their couplings — is available for counsel review under NDA. Three prior-art references were identified and mapped; none anticipates the combination.
All 7 DIAMONDs promoted, then the 13 highest GOLDs — tie-break: GREENLIGHT > NOVEL > MARGINAL. Each packaged attorney-ready: independent claim, drawings, prior-art citations, commercial kit, strategic angles. Package titles are withheld — the full claim map is available under NDA.
| # | Package | IPS | Tier | Collision | Part |
|---|---|---|---|---|---|
| 1 | Package 01 · mechanism withheld | 80 | DIAMOND | GREENLIGHT | Curvilinear |
| 2 | Package 02 · mechanism withheld | 77 | DIAMOND | GREENLIGHT | Atomic Litho |
| 3 | Package 03 · mechanism withheld | 77 | DIAMOND | GREENLIGHT | FEL |
| 4 | Package 04 · mechanism withheld | 77 | DIAMOND | NOVEL | SMO Reticle |
| 5 | Package 05 · mechanism withheld | 76 | DIAMOND | GREENLIGHT | Curvilinear |
| 6 | Package 06 · mechanism withheld | 76 | DIAMOND | NOVEL | FEL |
| 7 | Package 07 · mechanism withheld | 75 | DIAMOND | GREENLIGHT | FEL |
| 8 | Package 08 · mechanism withheld | 74 | GOLD | NOVEL | FEL |
| 9 | Package 09 · mechanism withheld | 73 | GOLD | NOVEL | EUV Mirror |
| 10 | Package 10 · mechanism withheld | 73 | GOLD | NOVEL | Atomic Litho |
| 11 | Package 11 · mechanism withheld | 71 | GOLD | NOVEL | EUV Mirror |
| 12 | Package 12 · mechanism withheld | 71 | GOLD | NOVEL | FEL |
| 13 | Package 13 · mechanism withheld | 71 | GOLD | NOVEL | FEL |
| 14 | Package 14 · mechanism withheld | 71 | GOLD | NOVEL | FEL |
| 15 | Package 15 · mechanism withheld | 71 | GOLD | NOVEL | Curvilinear |
| 16 | Package 16 · mechanism withheld | 71 | GOLD | MARGINAL | Atomic Litho |
| 17 | Package 17 · mechanism withheld | 70 | GOLD | GREENLIGHT | FEL |
| 18 | Package 18 · mechanism withheld | 70 | GOLD | NOVEL | EUV Mirror |
| 19 | Package 19 · mechanism withheld | 69 | GOLD | GREENLIGHT | SMO Reticle |
| 20 | Package 20 · mechanism withheld | 69 | GOLD | GREENLIGHT | FEL |
Full per-part reports — every rated idea, complete claims, and prior-art mapping — are held privately and released under NDA.
Collector optics for next-generation EUV sources. 1,701 ideas · 15 GOLD · top IPS 73.
Source-mask optimisation and reticle geometry. 926 ideas · 1 DIAMOND · top IPS 77.
Atom-beam lithography subsystem. 474 ideas · 1 DIAMOND · top IPS 77.
Superconducting undulator magnetics for next-generation EUV sources — the richest part, highest DIAMOND density. 1,606 ideas · 3 DIAMOND.
Curvilinear mask inspection — home to the portfolio's top-scoring patent (IPS 80). 868 ideas · 2 DIAMOND.
The 5-part tournament unification and the executive master report. SYNTH 8.2/10.